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Joseph Steigerwald M. Chemical Mechanical Planarization of Microelectronic Materials


Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its universality (material insensitivity), its applicability to multimaterial surfaces, and its relative cost-effectiveness, CMP is the ideal planarizing medium for the interlayered dielectrics and metal films used in silicon integrated circuit fabrication. But although the past decade has seen unprecedented research and development into CMP, there has been no single-source reference to this rapidly emerging technology-until now. Chemical Mechanical Planarization of Microelectronic Materials provides engineers and scientists working in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP. Authors Steigerwald, Murarka, and Gutmann-all leading CMP pioneers-provide a historical overview of CMP, explain the various chemical and mechanical concepts involved, describe CMP materials and processes, review the latest scientific data on CMP worldwide, and offer examples of its uses in the microelectronics industry. They provide detailed coverage of the CMP of various materials used in the making of microcircuitry: tungsten, aluminum, copper, polysilicon, and various dielectric materials, including polymers. The concluding chapter describes post-CMP cleaning techniques, and most chapters feature problem sets to assist readers in developing a more practical understanding of CMP. The only comprehensive reference to one of the fastest growing integrated circuit manufacturing technologies, Chemical Mechanical Planarization of Microelectronic Materials is an important resource for research scientists and engineers working in the microelectronics industry. An indispensable resource for scientists and engineers working in the microelectronics industry Chemical Mechanical Planarization of Microelectronic Materials is the only comprehensive single-source reference to one of the fastest growing integrated circuit manufacturing technologies. It provides engineers and scientists who work in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP, including: * The history of CMP * Chemical and mechanical underpinnings of CMP * CMP materials and processes * Applications of CMP in the microelectronics industry * The CMP of tungsten, aluminum, copper, polysilicon, and various dielectrics, including polymers used in integrated circuit fabrication * Post-CMP cleaning techniques * Chapter-end problem sets are also included to assist readers in developing a practical understanding of CMP.

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Jian-Fu Shao Thermo-Hydromechanical and Chemical Coupling in Geomaterials and Applications


GeoProc2008 collects the proceedings of the International Conference on Coupled T-H-M-C (thermal, hydraulic, mechanical, chemical) Processes in Geosystems.

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698 RUR
Steigerwald Arzneimittelwerk GmbH

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1 black single-sided adhesive rubber sheet 1x300x300mm chemical resistant high temperature mechanical hardware

113-65 113/65 Unbalanced Mechanical Seals With O-Ring Seat For corrosive chemical Sewage pumps (Material:TC/TC/Vit)

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CCPS (Center for Chemical Process Safety) Guidelines for Mechanical Integrity Systems


In recent years, process safety management system compliance audits have revealed that organizations often have significant opportunities for improving their Mechanical Integrity programs. As part of the Center for Chemical Process Safety's Guidelines series, Guidelines for Mechanical Integrity Systems provides practitioners a basic familiarity of mechanical integrity concepts and best practices. The book recommends efficient approaches for establishing a successful MI program. Note: CD-ROM/DVD and other supplementary materials are not included as part of eBook file.

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Joseph M. Steigerwald, Fellow, Technology Development ...

Joseph M. Steigerwald is Fellow, Technology Development Director, Chemical Mechanical Polish Technology at Intel Corp. View Joseph M. Steigerwald’s professional profile on Relationship Science, the database of decision makers.

Chemical Mechanical Planarization of Microelectronic ...

Joseph M. Steigerwald (Autor), Shyam P. Murarka (Autor), Ronald J. Gutmann (Autor) & 5,0 von 5 Sternen 1 Sternebewertung. Alle Formate und Ausgaben anzeigen Andere Formate und Ausgaben ausblenden. Preis Neu ab Gebraucht ab Gebundenes Buch "Bitte wiederholen" 1.084,59 € 1.084,59 € — Gebundenes Buch, 18. Februar 1997 — — 337,97 € Gebundenes Buch ab 337,97 € 1 Gebraucht ab 337,97 ...

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Joseph M. Steigerwald (Author) › Visit Amazon's Joseph M. Steigerwald Page. Find all the books, read about the author, and more. See search results for this author. Are you an author? Learn about Author Central. Joseph M. Steigerwald (Author), Shyam P. Murarka (Author), Ronald J. Gutmann (Author) & 5.0 out of 5 stars 1 rating. ISBN-13: 978-0471138273. ISBN-10: 0471138274. Why is ISBN ...

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Chemical Mechanical Planarization of Microelectronic ...

JOSEPH M. STEIGERWALD, PhD, works for the Intel Corporation in Hillsboro, Oregon. Currently developing CMP processes for dielectric films, he has also worked for Intel in the areas of plasma and wet etching of thin films. Dr. Steigerwald earned his PhD at Rensselaer Polytechnic Institute, where his thesis involved fundamental aspects of copper CMP. He holds a bachelor's degree in electrical ...

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Steigerwald – Wikipedia

Der Steigerwald (benannt nach der im Westen ansteigenden großen Keuperplatte dieser Landschaft) ist ein bis 498,5 m ü. NHN hohes Mittelgebirge im bayerisch-fränkischen Teil des Südwestdeutschen Stufenlandes zwischen Schweinfurt im Nordwesten, Uffenheim im Südwesten, Forchheim im Südosten und Bamberg im Nordosten. Er ist Teil des Keuperberglandes und wird innerhalb dessen nach Norden ...

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Joseph M Steigerwald was born on month day 1895, at birth place, New York, to Edward Sebastian Steigerwald and Margaret T. 'Maggie' Steigerwald (born Manion). Edward was born circa 1870, in Pennsylvania, USA. Margaret was born circa 1872, in New York, USA. Joseph had 10 siblings: James Francis Steigerwald, Earl S Steigerwald and 8 other siblings. Joseph married Mary A Steigerwald (born Rees ...

Wiley: Chemical Mechanical Planarization of ...

JOSEPH M. STEIGERWALD, PhD, works for the Intel Corporation in Hillsboro, Oregon. Currently developing CMP processes for dielectric films, he has also worked for Intel in the areas of plasma and wet etching of thin films. Dr. Steigerwald earned his PhD at Rensselaer Polytechnic Institute, where his thesis involved fundamental aspects of copper CMP. He holds a bachelor's degree in electrical ...

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Joseph M. Steigerwald's 23 research works with 646 citations and 657 reads, including: CMP of Other Materials and New CMP Applications

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Chemical Mechanical Planarization of Microelectronic ...

JOSEPH M. STEIGERWALD, PhD, works for the Intel Corporation in Hillsboro, Oregon. Currently developing CMP processes for dielectric films, he has also worked for Intel in the areas of plasma and wet etching of thin films. Dr. Steigerwald earned his PhD at Rensselaer Polytechnic Institute, where his thesis involved fundamental aspects of copper CMP. He holds a bachelor's degree in electrical ...

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Joseph Steigerwald (1887-1952) - Find A Grave Memorial

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Frances M. Steigerwald, beloved wife of William, mother of William Jr., George J. and Mary Costella, sister of Mary Bunker, Gertrude Walsh, Ben Motsch and the late Sybilla Weisbarth, Joseph, James and John Motsch, grandmother of 12. Services at St. Mary's Church (Holmes Ave.) Saturday at 10 a.m. Friends received at Finneran Funeral Home, 15433 St. Clair Ave., Friday 3-5 And 7-9 P.M.

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Steigerwald - Wikipedia

The Steigerwald is a hill region up to 498.5 m above sea level (NHN) in the Bavarian-Franconian part of the South German Scarplands between Würzburg and Nuremberg.It is part of the Keuper Uplands, and within it, it is continued to the north-northeast and right of the River Main, by the Haßberge, and to the south-southwest by the Franconian Heights.

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Steigerwald – Reiseführer auf Wikivoyage

Weitere Ziele []. Der 1 Baumwipfelpfad Steigerwald, Radstein 2, 96157 Ebrach.. ist ein 1152 m langer, durchgehend barrierefreier Pfad, in durchschnittlich 26 m Höhe über Grund, mit einem überwiegend aus Holz errichteten Aussichtsturm. letzte Änderung: Jan. 2021 Hintergrund []

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Ward Ian M. Mechanical Properties of Solid Polymers


Providing an updated and comprehensive account of the properties of solid polymers, the book covers all aspects of mechanical behaviour. This includes finite elastic behavior, linear viscoelasticity and mechanical relaxations, mechanical anisotropy, non-linear viscoelasicity, yield behavior and fracture. New to this edition is coverage of polymer nanocomposites, and molecular interpretations of yield, e.g. Bowden, Young, and Argon. The book begins by focusing on the structure of polymers, including their chemical composition and physical structure. It goes on to discuss the mechanical properties and behaviour of polymers, the statistical molecular theories of the rubber-like state and describes aspects of linear viscoelastic behaviour, its measurement, and experimental studies. Later chapters cover composites and experimental behaviour, relaxation transitions, stress and yielding. The book concludes with a discussion of breaking phenomena.

15517.86 RUR

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John Gilman J. Chemistry and Physics of Mechanical Hardness


A comprehensive treatment of the chemistry and physics of mechanical hardness Chemistry and Physics of Mechanical Hardness presents a general introduction to hardness measurement and the connections between hardness and fundamental materials properties. Beginning with an introduction on the importance of hardness in the development of technology, the book systematically covers: Indentation Chemical bonding Plastic deformation Covalent semiconductors Simple metals and alloys Transition metals Intermetallic compounds Ionic crystals Metal-metalloids Oxides Molecular crystals Polymers Glasses Hot hardness Chemical hardness Super-hard materials Chemistry and Physics of Mechanical Hardness is essential reading for materials scientists, mechanical engineers, metallurgists, ceramists, chemists, and physicists who are interested in learning how hardness is related to other properties and to the building blocks of everyday matter.

11285.71 RUR

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